—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
Delivery of content in networking and system administration curricula involves significant hands-on laboratory experience supplementing traditional classroom instruction at the Ro...
The growth of eCommerce is being hampered by a lack of trust between providers and consumers of Web-based services. While researchers in many disciplines have addressed Web trust i...
Yinan Yang, Lawrie Brown, Edward Lewis, Jan Newmar...
This paper presents an Application Specific Instruction Set Processor (ASIP) design for the implementation of a class of nonlinear image processing algorithms, the Retinex-like fi...
In this paper we present a flexible assessment framework for eLearning based on semantic web technologies. The assessment techniques are formalized as reasoning rules. These rules...