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VLSID
2006
IEEE
14 years 1 months ago
2006
IEEE
As the IC process technology scales, the oxide thickness and operating voltage continues to decrease. The gate oxide thickness in recent and future IC process technology has appro...
ITC
2003
IEEE
14 years 28 days ago
2003
IEEE
Burn-in faces significant challenges in recent CMOS technologies. The self-generated heat of each IC in a burn-in environment contributes to larger currents that can lead to furth...