This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...
— The constant increase in levels of integration and the reduction of the time-to-market have led to the definition of new methodologies stressing reuse. This involves not only ...
Giuseppe Ascia, Vincenzo Catania, Maurizio Palesi,...
As we move towards nanometer technology, manufacturing problems become overwhelmingly difficult to solve. Presently, optimization for manufacturability is performed at a post-synt...
Alessandra Nardi, Alberto L. Sangiovanni-Vincentel...
f abstraction as applicable to break the problem's complexity, and innovating better techniques to address complexity of new microarchitectural features. Validation techniques...
Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...