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» Design Methodology and Manufacture of a Microinductor
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DAC
1999
ACM
14 years 8 months ago
Subwavelength Lithography and Its Potential Impact on Design and EDA
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...
Andrew B. Kahng, Y. C. Pati
ESTIMEDIA
2003
Springer
14 years 18 days ago
EPIC-Explorer: A Parameterized VLIW-based Platform Framework for Design Space Exploration
— The constant increase in levels of integration and the reduction of the time-to-market have led to the definition of new methodologies stressing reuse. This involves not only ...
Giuseppe Ascia, Vincenzo Catania, Maurizio Palesi,...
DATE
2004
IEEE
128views Hardware» more  DATE 2004»
13 years 11 months ago
Synthesis for Manufacturability: A Sanity Check
As we move towards nanometer technology, manufacturing problems become overwhelmingly difficult to solve. Presently, optimization for manufacturability is performed at a post-synt...
Alessandra Nardi, Alberto L. Sangiovanni-Vincentel...
DT
2000
88views more  DT 2000»
13 years 7 months ago
Postsilicon Validation Methodology for Microprocessors
f abstraction as applicable to break the problem's complexity, and innovating better techniques to address complexity of new microarchitectural features. Validation techniques...
Hemant G. Rotithor
ISQED
2003
IEEE
96views Hardware» more  ISQED 2003»
14 years 20 days ago
New DFM Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains
Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...