A novel method for the segmentation of double-sided ancient document images suffering from bleed-through effect is presented. It takes advantage of the level set framework to prov...
We propose a system to process multispectral scans of double-sided documents. It can co-register any number of recto and verso channel maps, and reduce the bleed-through/show-thro...
Anna Tonazzini, Gianfranco Bianco, Emanuele Salern...
: Identifying PSL(2, C) as a projective group for patterns in the conformal camera model, the projective harmonic analysis on its double covering group SL(2, C) is presented in the...
Double patterning lithography seems to be a prominent choice for 32nm and 22nm technologies. Double patterning lithography techniques require additional masks for a single interco...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...