In very deep-submicron VLSI, certain manufacturing steps – notably optical exposure, resist development and etch, chemical vapor deposition and chemical-mechanical polishing (CM...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Huij...
We present a new methodology which takes into consideration the effect of Within-Die (WID) process variations on a low-voltage parallel system. We show that in the presence of pro...
Navid Azizi, Muhammad M. Khellah, Vivek De, Farid ...
Field programmable dual-Vdd interconnects are effective to reduce FPGA power. Assuming uniform length interconnects, existing work has developed time slack budgeting to minimize p...
The PDDL3 specifications include soft goals and trajectory constraints for distinguishing highquality plans among the many feasible plans in a solution space. To reduce the compl...
Chih-Wei Hsu, Benjamin W. Wah, Ruoyun Huang, Yixin...
The current best conformant probabilistic planners encode the problem as a bounded length CSP or SAT problem. While these approaches can find optimal solutions for given plan leng...
Daniel Bryce, Subbarao Kambhampati, David E. Smith