—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
To our best knowledge, all existing graph pattern mining algorithms can only mine either closed, maximal or the complete set of frequent subgraphs instead of graph generators whic...
Zhiping Zeng, Jianyong Wang, Jun Zhang, Lizhu Zhou
Code restructuring compilers rely heavily on program analysis techniques to automatically detect data dependences between program statements. Dependences between statement instanc...
Johnnie Birch, Robert A. van Engelen, Kyle A. Gall...
Since the emergence of extensive multimedia data, feature fusion has been more and more important for image and video retrieval, indexing and annotation. Existing feature fusion t...
Yun Fu, Liangliang Cao, Guodong Guo, Thomas S. Hua...
Abstract: Advances in technology now make it possible to integrate hundreds of cores (e.g. general or special purpose processors, embedded memories, application specific components...