189 search results - page 28 / 38 » Enabling industrial scale simulation emulation models |
ISCA
2002
IEEE
14 years 14 days ago
2002
IEEE
Due to shrinking technologies and increasing design sizes, it is becoming more difficult and expensive to distribute a global clock signal with low skew throughout a processor di...
DAC
2000
ACM
13 years 12 months ago
2000
ACM
—Chemical–mechanical polishing (CMP) is an enabling technique used in deep-submicrometer VLSI manufacturing to achieve long range oxide planarization. Post-CMP oxide topography...
DATE
2009
IEEE
14 years 2 months ago
2009
IEEE
With the relentless scaling of semiconductor technology, the lifetime reliability of embedded multiprocessor platforms has become one of the major concerns for the industry. If th...
VLSID
2004
IEEE
14 years 8 months ago
2004
IEEE
Abstract--In this paper, we present a new approach to calculate the steady state resistance values for CMOS library gates. These resistances are defined as simple equivalent models...
CGVR
2007
13 years 9 months ago
2007
- We propose significant simplifications in muscle modeling and simulation to facilitate real-time anatomical skin deformation for full-body articulated characters. The muscle shap...