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DAC
2006
ACM
14 years 8 months ago
Process variation aware OPC with variational lithography modeling
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
Peng Yu, Sean X. Shi, David Z. Pan
ICSE
2007
IEEE-ACM
14 years 7 months ago
Path-Sensitive Inference of Function Precedence Protocols
Function precedence protocols define ordering relations among function calls in a program. In some instances, precedence protocols are well-understood (e.g., a call to pthread mut...
Murali Krishna Ramanathan, Ananth Grama, Suresh Ja...
AAAI
1990
13 years 8 months ago
Backward Model Tracing: An Explanation-Based Approach for Reconstructing Student Reasoning
An original methodology, called backward model tracing to model student performance which features a profitable integration of the bug collection and bug construction techniques i...
Danilo Fum, Paolo Giangrandi, Carlo Tasso
COLING
2002
13 years 7 months ago
Robust Interpretation of User Requests for Text Retrieval in a Multimodal Environment
We describe a parser for robust and flexible interpretation of user utterances in a multi-modal system for web search in newspaper databases. Users can speak or type, and they can...
Alexandra Klein, Estela Puig-Waldmüller, Hara...
ISCA
2010
IEEE
336views Hardware» more  ISCA 2010»
13 years 12 months ago
Reducing cache power with low-cost, multi-bit error-correcting codes
Technology advancements have enabled the integration of large on-die embedded DRAM (eDRAM) caches. eDRAM is significantly denser than traditional SRAMs, but must be periodically r...
Chris Wilkerson, Alaa R. Alameldeen, Zeshan Chisht...