Abstract. In this paper we introduce two novel algorithms for drawing sequences of orthogonal and hierarchical graphs while preserving the mental map. Both algorithms can be parame...
In the last decade several algorithms that generate straight-line drawings of general large graphs have been invented. In this paper we investigate some of these methods that are ...
Abstract. Constrained stress majorization is a promising new technique for integrating application specific layout constraints into forcedirected graph layout. We significantly i...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
We present interactive visual aids to support the exploration and navigation of graph layouts. They include Fisheye Tree Views and Composite Lenses. These views provide, in an int...
Christian Tominski, James Abello, Frank van Ham, H...