Abstract--In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different ex...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
As Double Patterning Lithography(DPL) becomes the leading candidate for sub-30nm lithography process, we need a fast and lithography friendly decomposition framework. In this pape...
Jae-Seok Yang, Katrina Lu, Minsik Cho, Kun Yuan, D...
— Double patterning technology (DPT) is a most likely lithography solution for 32/22nm technology nodes as of 2008 due to the delay of Extreme Ultra Violet lithography. However, ...
In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...