The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing...
Sreeja Raj, Sarma B. K. Vrudhula, Janet Meiling Wa...
— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...
There is a wide variety of data mining methods available, and it is generally useful in exploratory data analysis to use many different methods for the same dataset. This, however...
This paper explores the mathematical and algorithmic properties of two sample-based microtexture models: random phase noise (RPN ) and asymptotic discrete spot noise (ADSN ). Thes...
Optimal Component Analysis (OCA) is a linear method for feature extraction and dimension reduction. It has been widely used in many applications such as face and object recognitio...