We propose practical iterated methods for layout density control for CMP uniformity, based on linear programming, Monte-Carlo and greedy algorithms. We experimentally study the tr...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...
Chemical-mechanical polishing (CMP) and other manufacturing steps in very deep submicron VLSI have varying effects on device and interconnect features, depending on local character...
Yu Chen, Andrew B. Kahng, Gabriel Robins, Alexande...
Image synthesis algorithms are commonly compared on the basis of running times and/or perceived quality of the generated images. In the case of Monte Carlo techniques, assessment ...
To reduce manufacturing variation due to chemicalmechanical polishing and to improve yield, layout must be made uniform with respect to density criteria. This is achieved by layou...
Andrew B. Kahng, Gabriel Robins, Anish Singh, Alex...