Abstract. The continuous miniaturization of semiconductor devices imposes serious threats to design robustness against process variations and environmental fluctuations. Modern ci...
Chin-Hsiung Hsu, Szu-Jui Chou, Jie-Hong Roland Jia...
Variation is a significant concern in nanometer-scale CMOS due to manufacturing equipment being pushed to fundamental limits, particularly in lithography. In this paper, we review...
Good robot performance often relies upon the selection of design parameters that lead to a well conditioned Jacobian or impedance "design" matrix. In this paper, a new d...
Abstract-- Increasing delay and power variation are significant challenges to the designers as technology scales to the deep sub-micron (DSM) regime. Traditional module selection t...
Partitioning and clustering are crucial steps in circuit layout for handling large scale designs enabled by the deep submicron technologies. Retiming is an important sequential lo...