The ability to account for the growing impacts of multiple process variations in modern technologies is becoming an integral part of nanometer VLSI design. Under the context of ti...
As Si CMOS devices are scaled down into the nanoscale regime, current computer architecture approaches are reaching their practical limits. Future nano-architectures will confront...
Kundan Nepal, R. Iris Bahar, Joseph L. Mundy, Will...
Abstract— The impact of process variations increases as technology scales to nanometer region. Under large process variations, the path and arc/node criticality [18] provide effe...
Process technology and environment-induced variability of gates and wires in VLSI circuits make timing analyses of such circuits a challenging task. Process variation can have a s...
A primary constraint in wireless sensor networks (WSNs) is obtaining reliable and prolonged network operation with power-limited sensor nodes. Most of the approaches to the energy ...