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ICCAD
2009
IEEE
13 years 6 months ago
2009
IEEE
With the adoption of ultra regular fabric paradigms for controlling design printability at the 22nm node and beyond, there is an emerging need for a layout-driven, pattern-based p...
ICCAD
2009
IEEE
13 years 6 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ICCV
2009
IEEE
13 years 6 months ago
2009
IEEE
This paper revisits the classical problem of detecting interest points, popularly known as "corners," in 2D images by proposing a technique based on fitting algebraic sh...
ICCV
2009
IEEE
13 years 6 months ago
2009
IEEE
Dense 3D reconstruction of extremely fast moving objects could contribute to various applications such as body structure analysis and accident avoidance and so on. The actual case...
ICDM
2009
IEEE
13 years 6 months ago
2009
IEEE
Discovering episodes, frequent sets of events from a sequence has been an active field in pattern mining. Traditionally, a level-wise approach is used to discover all frequent epis...