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DATE
2009
IEEE
14 years 5 months ago
2009
IEEE
— Lithographic variability and its impact on printability is a major concern in today’s semiconductor manufacturing process. To address sub-wavelength printability, a number of...
ICCAD
2009
IEEE
13 years 8 months ago
2009
IEEE
With increasing process variation, binning has become an important technique to improve the values of fabricated chips, especially in high performance microprocessors where transpa...
ICCAD
2009
IEEE
13 years 8 months ago
2009
IEEE
As VLSI technology reaches 45nm technology node, leakage power optimization has become a major design challenge. Threshold voltage (vt) assignment has been extensively studied, du...