— This paper proposes a selective pattern-compression scheme to minimize both test power and test data volume during scan-based testing. The proposed scheme will selectively supp...
Abstract—This paper presents a multiparameter momentmatching based model order reduction technique for parameterized interconnect networks via a novel two-directional Arnoldi pro...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
— The orientation of a bus is defined as the direction from the Least Significant Bit (LSB) to the Most Significant Bit (MSB). Bused pin flipping is a property that allows severa...