ISQED
2007
IEEE
14 years 5 months ago
2007
IEEE
For emerging deep-subwavelength lithography technologies (90 nm and following) the data volume and the complexity of Optical Proximity Correction (OPC) have increased dramatically...
DAC
2003
ACM
15 years 15 days ago
2003
ACM
As minimum feature sizes continue to shrink, patterned features have become significantly smaller than the wavelength of light used in optical lithography. As a result, the requir...
DAC
1999
ACM
15 years 15 days ago
1999
ACM
This tutorial paper surveys the potential implications of subwavelength optical lithography for new tools and flows in the interface between layout design and manufacturability. W...