Analysis of resistive-bridging defects in SRAM core-cells: A comparative study from 90nm down to 40nm technology nodes

ÑIn this paper, we present a comparative study on the effects of resistive-bridging defects in the SRAM core-cells, considering different technology nodes. In particular, we analyze industrial designs of SRAM core-cell at the following technology nodes: 90nm, 65nm and 40nm. We have performed an extensive number of simulations, varying the resistive value of defects, the power supply voltage, the memory size and the temperature. Experimental results show malfunctions not only within the defective core-cell, but also in other core-cells (defect-free) of the memory array. KeywordsÑSRAM, core-cell, resistive-bridge, fault modeling.

• Type: Journal
• Year: 2010
• Where: ETS
• Authors: Renan Alves Fonseca, Luigi Dilillo, Alberto Bosio, Patrick Girard, Serge Pravossoudovitch, Arnaud Virazel, Nabil Badereddine
• Keywords: Comparative Study, ETS 2010, Hardware, Power Supply Voltage, Sram Core-cell