167
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DAC
2009
ACM
16 years 7 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
151
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DAC
2009
ACM
16 years 7 months ago
2009
ACM
Silicon nanowires are a promising solution to address the increasing challenges of fabrication and design at the future nodes of the Complementary Metal-Oxide-Semiconductor (CMOS)...
133
click to vote
DAC
2009
ACM
16 years 7 months ago
2009
ACM
This paper presents a technique to improve the storage density of spin-torque transfer (STT) magnetoresistive random access memory (MRAM) in the presence of significant magnetic t...
140
Voted
DAC
2009
ACM
16 years 7 months ago
2009
ACM
Application profiling ? the process of monitoring an application to determine the frequency of execution within specific regions ? is an essential step within the design process f...
151
click to vote
DAC
2009
ACM
16 years 7 months ago
2009
ACM
Functional validation of a processor design through execution of a suite of test programs is common industrial practice. In this paper, we develop a high-level architectural speci...
160
Voted
DAC
2009
ACM
16 years 7 months ago
2009
ACM
Power consumption of system-level on-chip communications is becoming more significant in the overall system-on-chip (SoC) power as technology scales down. In this paper, we propos...
177
Voted
DAC
2009
ACM
16 years 7 months ago
2009
ACM
Continuously shrinking feature sizes result in an increasing susceptibility of circuits to transient faults, e.g. due to environmental radiation. Approaches to implement fault tol...
177
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DAC
2009
ACM
16 years 7 months ago
2009
ACM
Embedded cryptosystems show increased vulnerabilities to implementation attacks such as power analysis. CMOS technology trends are causing increased process variations which impac...