Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
—Logic optimization is the step of the very large scale integration (VLSI) design cycle where the designer performs modifications on a design to satisfy different constraints suc...
Andreas G. Veneris, Magdy S. Abadir, Mandana Amiri
We propose a unified and simple approach for capturing and recreating 3D sound fields by exploring the reciprocity principle that is satisfied between the two processes. Our appro...
Abstract. Modern software engineering attacks its complexity problems by applying well-understood development principles. In particular, the systematic adoption of design patterns ...
Hans-Werner Sehring, Sebastian Bossung, Patrick Hu...
Abstract. Covering quality aspects such as usability through the software development life cycle is challenging. These “-ilities” are generally difficult to grasp and usually ...