17 search results - page 2 / 4 » A matching based decomposer for double patterning lithograph... |
ASPDAC
2009
ACM
14 years 1 months ago
2009
ACM
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
ICCAD
2009
IEEE
13 years 5 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
ICCAD
2008
IEEE
14 years 4 months ago
2008
IEEE
— As Double Patterning Technology (DPT) becomes the only solution for 32-nm lithography process, we need to investigate how DPT affects the performance of a chip. In this paper, ...
ICCAD
2009
IEEE
13 years 5 months ago
2009
IEEE
Double patterning technology (DPT) has emerged as the most hopeful candidate for the next technology node of the ITRS roadmap [1]. The goal of a DPT decomposer is to decompose the...
ICASSP
2011
IEEE
12 years 11 months ago
2011
IEEE
We present a novel sparse representation based approach for the restoration of clipped audio signals. In the proposed approach, the clipped signal is decomposed into overlapping f...