We present an efficient optimization scheme for gate sizing in the presence of process variations. Our method is a worst-case design scheme, but it reduces the pessimism involved i...
Jaskirat Singh, Zhi-Quan Luo, Sachin S. Sapatnekar
- Technology scaling and sub-wavelength optical lithography is associated with significant process variations. We propose a self-adaptive variable supply-voltage scaling (SAVS) tec...
— Increasingly prominent variational effects impose imminent threat to the progress of VLSI technology. This work explores redundancy, which is a well-known fault tolerance techn...
Di Wu, Ganesh Venkataraman, Jiang Hu, Quiyang Li, ...
This paper proposes an equation-based multi-scenario iterative robust optimization methodology for analog/mixed-signal circuits. We show that due to local circuit performance mono...
—As device feature size continues to shrink, reliability becomes a severe issue due to process variation, particle-induced transient errors, and transistor wear-out/stress such a...
Jin Sun, Avinash Karanth Kodi, Ahmed Louri, Janet ...