Design for Manufacturability (DFM) is becoming increasingly important as process geometries shrink. Conventional design rule pass/fail is not adequate to quantify DFM compliance. ...
Approach Abstracts AltPSM Lithography Requirements for sub-100nm IC Design Domains Pradiptya Ghosh, Chung-shin Kang, Michael Sanie and David Pinto Numerical Technologies, 70 West P...
Pradiptya Ghosh, Chung-shin Kang, Michael Sanie, D...
- Key characteristics of newly emerging IC technologies render the traditional concept of die size minimization and traditional "design rules" insufficient to handle the ...
Wojciech Maly, Hans T. Heineken, Jitendra Khare, P...
Manufacturable design requires matching of interconnects which have equal nominal dimensions. New design rules are projected to bring guarantee rules for interconnect matching. In...