3 search results - page 1 / 1 » Dummy fill optimization for enhanced manufacturability |
ISPD
2010
ACM
14 years 2 months ago
2010
ACM
ASPDAC
2007
ACM
13 years 11 months ago
2007
ACM
As integrated circuits manufacturing technology is advancing into 65nm and 45nm nodes, extensive resolution enhancement techniques (RETs) are needed to correctly manufacture a chip...
DAC
2008
ACM
14 years 8 months ago
2008
ACM
In this paper, we present ELIAD, an efficient lithography aware detailed router to optimize silicon image after optical proximity correction (OPC) in a correct-by-construction man...