996 search results - page 192 / 200 » Enhancing UML Models: A Domain Analysis Approach |
ICSE
2010
IEEE-ACM
13 years 9 months ago
2010
IEEE-ACM
The feature list of modern IDEs is steadily growing and mastering these tools becomes more and more demanding, especially for novice programmers. Despite their remarkable capabili...
ICCAD
2009
IEEE
13 years 5 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
CIKM
2005
Springer
14 years 1 months ago
2005
Springer
This paper presents a new approach to determine the senses of words in queries by using WordNet. In our approach, noun phrases in a query are determined first. For each word in th...
DSD
2009
IEEE
14 years 2 months ago
2009
IEEE
Abstract—Verification of application requirements is becoming a bottleneck in system-on-chip design, as the number of applications grows. Traditionally, the verification comple...
IQ
2007
13 years 9 months ago
2007
: Motivated by the problem of out-of-shelf (OOS) in retail industry and the emergence of RFID (Radio Frequency Identification) technology, this paper investigates the impact that t...