4880 search results - page 836 / 976 » Mechanism Design by Creditability |
145
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ICCAD
2009
IEEE
15 years 2 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
216
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ECSA
2011
Springer
14 years 4 months ago
2011
Springer
Modeling of software architectures is a fundamental part of software development processes. Reuse of software components and early analysis of software topologies allow the reduct...
207
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SOSP
2009
ACM
16 years 1 months ago
2009
ACM
We present ClearView, a system for automatically patching errors in deployed software. ClearView works on stripped Windows x86 binaries without any need for source code, debugging...
165
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ICS
2009
Tsinghua U.
15 years 11 months ago
2009
Tsinghua U.
The L2 cache is commonly managed using LRU policy. For workloads that have a working set larger than L2 cache, LRU behaves poorly, resulting in a great number of less reused lines...
137
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BMCBI
2010
15 years 4 months ago
2010
Background: Gene silencing using exogenous small interfering RNAs (siRNAs) is now a widespread molecular tool for gene functional study and new-drug target identification. The key...