Current lithography techniques use a light wavelength of 193nm to print sub-65nm features. This introduces process variations which cause mismatches between desired and actual waf...
This paper presents three techniques for using an iterated local search algorithm to improve the performance of a state-of-the-art branch and bound algorithm for job shop scheduli...
We propose and analyze an extremely fast, efficient and simple method for solving the problem: min{ u 1 :Au=f,u∈Rn }. This method was first described in [1], with more details i...
In nanometer regime, the effects of process variations are dominating circuit performance, power and reliability of circuits. Hence, it is important to properly manage variation e...
The nonuniform substrate thermal profile and process variations are two major concerns in the present-day ultradeep submicrometer designs. To correctly predict performance/ leakage...