Deep submicron processes have allowed FPGAs to grow in complexity and speed. However, such technology scaling has caused FPGAs to become more susceptible to the effects of process...
In this paper, we present novel algorithms that effectively combine physical layout and early logic synthesis to improve overall design quality. In addition, we employ partitionin...
This paper presents a novel placement algorithm for timing optimization based on a new and powerful concept, which we term differential timing analysis. Recognizing that accurate ...
Amit Chowdhary, Karthik Rajagopal, Satish Venkates...
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...