While the increasing need for addressing process variability in sub-90nm VLSI technologies has sparkled a large body of statistical timing and optimization research, the realizati...
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the e...
In this paper, we present the design of a P4 (Power-PerformanceProcess-Parasitic) aware voltage controlled oscillator (VCO) at nanoCMOS technologies. Through simulations, we have ...
We propose a novel design flow for mismatch and processvariation aware optimization of nanoscale CMOS Active Pixel Sensor (APS) arrays. As a case study, an 8 × 8 APS array is de...
Abstract— The impact of process variations increases as technology scales to nanometer region. Under large process variations, the path and arc/node criticality [18] provide effe...