As we move from deep submicron technology to nanotechnology for device manufacture, the need for defect-tolerant architectures is gaining importance. This is because, at the nanos...
Gethin Norman, David Parker, Marta Z. Kwiatkowska,...
The formiila-based I<,JJ model is a figiire of merit for the inductive coirpling, and has been used to solve the simrrltaneoris shield insertion and net ordering (SINO) and sim...
— As Double Patterning Technology (DPT) becomes the only solution for 32-nm lithography process, we need to investigate how DPT affects the performance of a chip. In this paper, ...
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
Statistical Static Timing Analysis has received wide attention recently and emerged as a viable technique for manufacturability analysis. To be useful, however, it is important th...