846 search results - page 118 / 170 » The Use of Z |
VLSID
2004
IEEE
14 years 9 months ago
2004
IEEE
As we move from deep submicron technology to nanotechnology for device manufacture, the need for defect-tolerant architectures is gaining importance. This is because, at the nanos...
ICCD
2001
IEEE
14 years 6 months ago
2001
IEEE
The formiila-based I<,JJ model is a figiire of merit for the inductive coirpling, and has been used to solve the simrrltaneoris shield insertion and net ordering (SINO) and sim...
ICCAD
2008
IEEE
14 years 6 months ago
2008
IEEE
— As Double Patterning Technology (DPT) becomes the only solution for 32-nm lithography process, we need to investigate how DPT affects the performance of a chip. In this paper, ...
ICCAD
2007
IEEE
14 years 6 months ago
2007
IEEE
—As the 193nm lithography is likely to be used for 45nm and even 32nm processes, much more stringent requirement will be posed on Optical Proximity Correction (OPC) technologies....
ICCAD
2006
IEEE
14 years 6 months ago
2006
IEEE
Statistical Static Timing Analysis has received wide attention recently and emerged as a viable technique for manufacturability analysis. To be useful, however, it is important th...