—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
While process variations are becoming more significant with each new IC technology generation, they are often modeled via linear regression models so that the resulting performanc...
Xin Li, Jiayong Le, Padmini Gopalakrishnan, Lawren...
We propose a new method addressing the problem of template drift, a common phenomenon in which the target gradually shifts away from the template in object tracking. Much effort h...
The identification of speedpaths is required for post-silicon (PS) timing validation, and it is currently becoming timeconsuming due to manufacturing variations. In this paper we...
Color quantization replaces the color of each pixel with the closest representative color, and thus it makes the resulting image partitioned into uniformly-colored regions. As a c...