One of the most difficult and time-consuming steps in the creation of an FPGA is its transistor-level design and physical layout. Modern commercial FPGAs typically consume anywher...
Ketan Padalia, Ryan Fung, Mark Bourgeault, Aaron E...
Abstract—Antenna problem is a phenomenon of plasma-induced gateoxide degradation. It directly affects manufacturability of very large scale integration (VLSI) circuits, especiall...
Li-Da Huang, Xiaoping Tang, Hua Xiang, D. F. Wong,...
As chip size and design density increase, coupling effects (crosstalk) between signal wires become increasingly critical to on–chip timing and even functionality. A method is pr...
— Chemical-Mechanical Polishing (CMP) is one of the key steps during nanometer VLSI manufacturing process where minimum variation of layout pattern densities is desired. This pap...
Congestion estimation is an important issue for the success of the VLSI layout. Fast congestion estimation provides an efficient means to adjust the placement and wire planning. A...