Sciweavers

ICCAD
2005
IEEE

FPGA device and architecture evaluation considering process variations

14 years 8 months ago
FPGA device and architecture evaluation considering process variations
Process variations in nanometer technologies are becoming an important issue for cutting-edge FPGAs with a multimillion gate capacity. Considering both die-to-die and withindie variations in effective channel length, threshold voltage, and gate oxide thickness, we first develop closed-form models of leakage and timing variations at the FPGA chip level. Experiments show that our models are within 3% from Monte Carlo simulation, and the leakage and delay variations can
Ho-Yan Wong, Lerong Cheng, Yan Lin, Lei He
Added 16 Mar 2010
Updated 16 Mar 2010
Type Conference
Year 2005
Where ICCAD
Authors Ho-Yan Wong, Lerong Cheng, Yan Lin, Lei He
Comments (0)