Abstract. The continuous miniaturization of semiconductor devices imposes serious threats to design robustness against process variations and environmental fluctuations. Modern ci...
Chin-Hsiung Hsu, Szu-Jui Chou, Jie-Hong Roland Jia...
— Variability in the chip design process has been relatively increasing with technology scaling to smaller dimensions. Using worst case analysis for circuit optimization severely...
The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing...
Sreeja Raj, Sarma B. K. Vrudhula, Janet Meiling Wa...
—As process variations become a significant problem in deep sub-micron technology, a shift from deterministic static timing analysis to statistical static timing analysis for hig...
Process variation has become a major concern in the design of many nanometer circuits, including interconnect pipelines. This paper develops closed-form models to predict the dela...