Starting at the 65-nm node, stress engineering to improve the performance of transistors has been a major industry focus. An intrinsic stress source--shallow trench isolation (STI)...
Andrew B. Kahng, Puneet Sharma, Rasit Onur Topalog...
As CMOS technology scales deeper into the nanometer regime, factors such as leakage power and chip temperature emerge as critically important concerns for high-performance VLSI des...
Due to the inherent nature of heat flow in 3D integrated circuits, stacked dies exhibit a wide range of thermal characteristics. The strong dependence of leakage with temperature...
Process and environmental variations continue to present significant challenges to designers of high-performance integrated circuits. In the past few years, while much research has...
Khaled R. Heloue, Chandramouli V. Kashyap, Farid N...
Systems with many integrated circuits (ICs), often of the same type, are increasingly common to meet the constant performance demand. However, systems in recent semiconductor techn...
Mudassar Majeed, Daniel Ahlstrom, Urban Ingelsson,...