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» Approach for physical design in sub-100 nm era
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DAC
2004
ACM
13 years 11 months ago
A methodology to improve timing yield in the presence of process variations
The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing...
Sreeja Raj, Sarma B. K. Vrudhula, Janet Meiling Wa...
TVLSI
2010
13 years 2 months ago
A Novel Variation-Tolerant Keeper Architecture for High-Performance Low-Power Wide Fan-In Dynamic or Gates
Dynamic gates have been excellent choice in the design of high-performance modules in modern microprocessors. The only limitation of dynamic gates is their relatively low noise mar...
Hamed F. Dadgour, Kaustav Banerjee
GI
2009
Springer
14 years 1 days ago
Challenges of Electronic CAD in the Nano Scale Era
: Future nano scale devices will expose different characteristics than todays silicon devices. While the exponential growth of non recurring expenses (NRE, mostly due to mask sets)...
Christian Hochberger, Andreas Koch
DAC
2000
ACM
14 years 8 months ago
Unifying behavioral synthesis and physical design
eously demand shorter and less costly design cycles. Designing at higher levels of abstraction makes both objectives achievable, but enabling techniques like behavioral synthesis h...
William E. Dougherty, Donald E. Thomas
ICCAD
2003
IEEE
145views Hardware» more  ICCAD 2003»
14 years 4 months ago
Manufacturing-Aware Physical Design
Ultra-deep submicron manufacturability impacts physical design (PD) through complex layout rules and large guardbands for process variability; this creates new requirements for ne...
Puneet Gupta, Andrew B. Kahng