Advancing technology drives design technology and thus design automation EDA. How to model interconnect, how to handle degradation of signal integrity and increasing power densi...
Ralph H. J. M. Otten, Raul Camposano, Patrick Groe...
Chemical-mechanical planarization (CMP) and other manufacturing steps in very deep-submicron VLSI have varying effects on device and interconnect features, depending on the local ...
— As microprocessor technology continues to scale into the nanometer regime, recent studies show that interconnect delay will be a limiting factor for performance, and multiple c...
: ExtraPlanT system is a multi-agent production planning system designed for small factories, which needs to react quickly on market changes. To deal with this requirement, ExtraPl...
This paper describes a mechanism for automatic design and synthesis of very long instruction word (VLIW), and its generalization, explicitly parallel instruction computing rocesso...