55 search results - page 3 / 11 » Lithography Driven Layout Design |
ISPD
2010
ACM
14 years 4 months ago
2010
ACM
Double Patterning Lithography (DPL) is one of the few hopeful candidate solutions for the lithography for CMOS process beyond 45nm. DPL assigns the patterns less than a certain di...
ASPDAC
2007
ACM
14 years 1 months ago
2007
ACM
Abstract-- Due to photo-lithography effects and manufacture process variations, the actual features fabricated on the wafer are different from the designed ones. This difference ca...
DAC
2009
ACM
14 years 10 months ago
2009
ACM
In double patterning lithography (DPL), coloring conflict and stitch minimization are the two main challenges. Post layout decomposition algorithm [1] [2]may not be enough to achi...
ASPDAC
2007
ACM
14 years 1 months ago
2007
ACM
As integrated circuits manufacturing technology is advancing into 65nm and 45nm nodes, extensive resolution enhancement techniques (RETs) are needed to correctly manufacture a chip...
ICCAD
2009
IEEE
13 years 7 months ago
2009
IEEE
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...