In double patterning lithography (DPL) layout decomposition for 45nm and below process nodes, two features must be assigned opposite colors (corresponding to different exposures)...
Andrew B. Kahng, Chul-Hong Park, Xu Xu, Hailong Ya...
A novel methodology for circuit design and automatic layout generation is proposed for a class of mixed-signal circuits in presence of layout parasitics and substrate induced nois...
Paolo Miliozzi, Iasson Vassiliou, Edoardo Charbon,...
This paper presents a methodology towards synthesis of high performance analog circuits. Layout parasitics are estimated and compensated during circuit sizing. Physical layout con...
Propagating scattered context grammars are used to generate their sentences together with their parses--that is, the sequences of labels denoting productions whose use lead to the ...
This paper presents a performance-oriented placement and routing tool for field-programmable gate arrays. Using recursive geometric partitioning for simultaneous placement and glo...
Michael J. Alexander, James P. Cohoon, Joseph L. G...