Abstract— Double patterning lithography (DPL) is in current production for memory products, and is widely viewed as inevitable for logic products at the 32nm node. DPL decomposes...
Double patterning lithography (DPL) is a likely resolution enhancement technique for IC production in 32nm and below technology nodes. However, DPL gives rise to two independent, ...
— We propose a character size optimization technique to enhance the throughput of maskless lithography as well as photomask manufacture. The number of electron beam shots to draw...
As wireless LAN devices become more prevalent in the consumer electronics market, there is an ever increasing pressure to reduce their overall cost. The test cost of such devices ...