With greater integration, the power dissipation in integrated circuits has begun to outpace the ability of today's heat sinks to limit the on-chip temperature. As a result, t...
Variations in the semiconductor fabrication process results in variability in parameters between transistors on the same die, a problem exacerbated by lithographic scaling. The re...
In this paper, a new method for evolving simple electronic circuits is discussed, with the aim of improving the reliability and performance of basic circuit blocks. Next-generatio...
In this paper, we propose a new linear programming based timing driven placement framework for high performance designs. Our LP framework is mainly net-based, but it takes advanta...
When VLSI technology scales toward 45nm, the lithography wavelength stays at 193nm. This large gap results in strong refractive effects in lithography. Consequently, it is a huge...