- In this paper, we present an algorithm for gate sizing with controlled displacement to improve the overall circuit timing. We use a path-based delay model to capture the timing c...
Variations in the semiconductor fabrication process results in variability in parameters between transistors on the same die, a problem exacerbated by lithographic scaling. The re...
This paper considers simultaneous gate and wire sizing for general very large scale integrated (VLSI) circuits under the Elmore delay model. We present a fast and exact algorithm w...
Leakage current is a key factor in IC power consumption even in the active operating mode. We investigate the simultaneous optimization of gate size and threshold voltage to reduc...
As technology scales to 40nm and beyond, intra-die process variability will cause large delay and leakage variations across a chip in addition to expected die-to-die variations. I...
Maryam Ashouei, Muhammad Mudassar Nisar, Abhijit C...