The ability to control the variations in IC fabrication process is rapidly diminishing as feature sizes continue towards the sub-100 nm regime. As a result, there is an increasing...
Sreeja Raj, Sarma B. K. Vrudhula, Janet Meiling Wa...
—As process variations become a significant problem in deep sub-micron technology, a shift from deterministic static timing analysis to statistical static timing analysis for hig...
Abstract. The continuous miniaturization of semiconductor devices imposes serious threats to design robustness against process variations and environmental fluctuations. Modern ci...
Chin-Hsiung Hsu, Szu-Jui Chou, Jie-Hong Roland Jia...
—Considering process variability at the behavior synthesis level is necessary, because it makes some instances of function units slower and others faster, resulting in unbalanced...
Starting from a model of the within-die systematic variations using principal components analysis, a model is proposed for estimation of the parametric yield, and is then applied ...