Security vulnerabilities continue to be an issue in the software field and new severe vulnerabilities are discovered in software products each month. This paper analyzes estimates...
—Double patterning lithography (DPL) provides an attractive alternative or a supplementary method to enable the 32nm and 22nm process nodes, relative to costlier technology optio...
Kwangok Jeong, Andrew B. Kahng, Rasit Onur Topalog...
It is well known that fill insertion adversely affects total and coupling capacitance of interconnects. While grounded fill can be extracted by full-chip extractors, floating ...
During recent years, microprocessor energy consumption has been surging and efforts to reduce power and energy have received a lot of attention. At the same time, virtual executio...