The impact of technology scaling on three run-time leakage reduction techniques (Input Vector Control, Body Bias Control and Power Supply Gating) is evaluated by determining limit...
Yuh-Fang Tsai, David Duarte, Narayanan Vijaykrishn...
One of the main challenges for design in the presence of process variations is to cope with the uncertainties in delay and leakage power. In this paper, the influence of leakage r...
- Traditionally, minimum possible area of a VLSI layout is considered the best for delay and power minimization due to decreased interconnect capacitance. This paper shows however ...
As a result of aggressive technology scaling, gate leakage (gate oxide direct tunneling) has become a major component of total power dissipation. Use of dielectrics of higher perm...
Saraju P. Mohanty, Ramakrishna Velagapudi, Elias K...
The high leakage current in nano-meter regimes is becoming a significant portion of power dissipation in CMOS circuits as threshold voltage, channel length, and gate oxide thickne...
Amit Agarwal, Chris H. Kim, Saibal Mukhopadhyay, K...