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Variations in the semiconductor fabrication process results in variability in parameters between transistors on the same die, a problem exacerbated by lithographic scaling. The re...
This paper approaches statistical optimization by examining gate delay variation models and optimization objectives. Most previous work on statistical optimization has focused exc...
Matthew R. Guthaus, Natesan Venkateswaran, Vladimi...
— As technology scales into the sub-90nm domain, manufacturing variations become an increasingly significant portion of circuit delay. As a result, delays must be modeled as sta...
Matthew R. Guthaus, Natesan Venkateswaran, Chandu ...
As technology continues to scale beyond 100nm, there is a significant increase in performance uncertainty of CMOS logic due to process and environmental variations. Traditional c...
Dinesh Patil, Sunghee Yun, Seung-Jean Kim, Alvin C...