33 search results - page 2 / 7 » Process variation aware OPC with variational lithography mod... |
DATE
2008
IEEE
14 years 5 months ago
2008
IEEE
SSTA has received a considerable amount of attention in recent years. However, it is a general rule that any approach can only be as accurate as the underlying models. Thus, varia...
ATS
2010
IEEE
13 years 9 months ago
2010
IEEE
Abstract--To achieve a high product quality for nano-scale systems both realistic defect mechanisms and process variations must be taken into account. While existing approaches for...
ICCD
2007
IEEE
14 years 7 months ago
2007
IEEE
As the VLSI technology marches beyond 65 and 45nm process technologies, variation in gate length has a direct impact on leakage and performance of CMOS transistors. Due to sub-wav...
CODES
2010
IEEE
13 years 9 months ago
2010
IEEE
The impact of process variation in state of the art technology makes traditional (worst case) designs unnecessarily pessimistic, which translates to suboptimal designs in terms of...
DAC
2008
ACM
14 years 12 months ago
2008
ACM
The threshold voltage (Vth) of a nanoscale transistor is severely affected by random dopant fluctuations and line-edge roughness. The analysis of these effects usually requires at...