282 search results - page 2 / 57 » Reliability- and process-variation aware design of integrate... |
TCAD
2008
13 years 6 months ago
2008
The nonuniform substrate thermal profile and process variations are two major concerns in the present-day ultradeep submicrometer designs. To correctly predict performance/ leakage...
FPGA
2007
ACM
14 years 1 months ago
2007
ACM
Chip design in the nanometer regime is becoming increasingly difficult due to process variations. ASIC designers have adopted statistical optimization techniques to mitigate the e...
FPL
2006
Springer
13 years 10 months ago
2006
Springer
Both custom IC and FPGA designs in the nanometer regime suffer from process variations. But different from custom ICs, FPGAs' programmability offers a unique design freedom t...
ISQED
2008
IEEE
14 years 1 months ago
2008
IEEE
In this paper we present a parasitic aware, process variation tolerant optimization methodology that may be applied to nanoscale circuits to ensure better yield. A currentstarved ...
MICRO
2008
IEEE
14 years 1 months ago
2008
IEEE
—Negative bias temperature instability (NBTI), which reduces the lifetime of PMOS transistors, is becoming a growing reliability concern for sub-micrometer CMOS technologies. Par...