1192 search results - page 1 / 239 » Variation-Aware Fault Modeling |
ATS
2010
IEEE
13 years 9 months ago
2010
IEEE
Abstract--To achieve a high product quality for nano-scale systems both realistic defect mechanisms and process variations must be taken into account. While existing approaches for...
DAC
2006
ACM
14 years 11 months ago
2006
ACM
Optical proximity correction (OPC) is one of the most widely used resolution enhancement techniques (RET) in nanometer designs to improve subwavelength printability. Conventional ...
ISQED
2007
IEEE
14 years 5 months ago
2007
IEEE
In nanometer regime, the effects of variations are having an increasing impact on the delay and power characteristics of devices as well as the yield of the circuit. Statistical t...
ISVLSI
2008
IEEE
14 years 5 months ago
2008
IEEE
In nanometer regime, the effects of process variations are dominating circuit performance, power and reliability of circuits. Hence, it is important to properly manage variation e...
ISQED
2007
IEEE
14 years 5 months ago
2007
IEEE
This paper studies the impact of variability on the noise robustness of logic gates using noise rejection curves (NRCs). NRCs allow noise pulses to be modeled using magnitude-dura...